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Interface characterization in III-V CMOS nanoelectronics

  • L. V. Goncharova
  • , O. Celik
  • , T. Gustafsson
  • , E. Garfunkel
  • , M. Warusawithana
  • , D. G. Schlom
  • , H. Wen
  • , M. B. Santos
  • , Safak Sayan
  • , Wilman Tsai
  • , Niti Goel
  • Rutgers University–New Brunswick
  • Pennsylvania State University
  • Univ. of Oklahoma
  • Intel Corporation

Research output: Chapter or Contribution to BookLiterary contribution

Original languageEnglish
Title of host publicationECS Transactions - 5th International Symposium on High Dielectric Constant Materials and Gate Stacks
Pages117-122
Number of pages6
Edition4
ISBN (Electronic)9781566775700
DOIs
StatePublished - 2007
Externally publishedYes
Event5th International Symposium on High Dielectric Constant Materials and Gate Stacks - 212th ECS Meeting - Washington, DC, United States
Duration: Oct 8 2007Oct 10 2007

Publication series

NameECS Transactions
Number4
Volume11
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference5th International Symposium on High Dielectric Constant Materials and Gate Stacks - 212th ECS Meeting
Country/TerritoryUnited States
CityWashington, DC
Period10/8/0710/10/07

ASJC Scopus Subject Areas

  • General Engineering

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