Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

Alexandra M. Patron; Alisha M. Bramer; Daniel F. Santavicca; Thomas J. Mullen

doi:10.1021/acs.jpcc.9b10364

Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

Alexandra M. Patron, Alisha M. Bramer, Daniel F. Santavicca, Thomas J. Mullen

University of North Florida

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1214-1219
Number of pages	6
Journal	Journal of Physical Chemistry C
Volume	124
Issue number	1
DOIs	https://doi.org/10.1021/acs.jpcc.9b10364
State	Published - Jan 9 2020

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
General Energy
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

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10.1021/acs.jpcc.9b10364

Cite this

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title = "Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography",

author = "Patron, {Alexandra M.} and Bramer, {Alisha M.} and Santavicca, {Daniel F.} and Mullen, {Thomas J.}",

note = "Publisher Copyright: Copyright {\textcopyright} 2019 American Chemical Society.",

year = "2020",

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doi = "10.1021/acs.jpcc.9b10364",

language = "English",

volume = "124",

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AU - Patron, Alexandra M.

AU - Bramer, Alisha M.

AU - Santavicca, Daniel F.

AU - Mullen, Thomas J.

PY - 2020/1/9

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IS - 1

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Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

ASJC Scopus Subject Areas

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