TY - JOUR
T1 - Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography
AU - Patron, Alexandra M.
AU - Bramer, Alisha M.
AU - Santavicca, Daniel F.
AU - Mullen, Thomas J.
N1 - Publisher Copyright:
Copyright © 2019 American Chemical Society.
PY - 2020/1/9
Y1 - 2020/1/9
UR - https://www.scopus.com/pages/publications/85077015126
UR - https://www.scopus.com/pages/publications/85077015126#tab=citedBy
U2 - 10.1021/acs.jpcc.9b10364
DO - 10.1021/acs.jpcc.9b10364
M3 - Article
AN - SCOPUS:85077015126
SN - 1932-7447
VL - 124
SP - 1214
EP - 1219
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
IS - 1
ER -