Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

Producción científica: Article › revisión exhaustiva

Idioma original	English
Páginas (desde-hasta)	1214-1219
Número de páginas	6
Publicación	Journal of Physical Chemistry C
Volumen	124
N.º	1
DOI	https://doi.org/10.1021/acs.jpcc.9b10364
Estado	Published - ene 9 2020

ASJC Scopus Subject Areas

@article{13620df7a9b14642b36e2abc85a0cc20,

title = "Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography",

author = "Patron, \{Alexandra M.\} and Bramer, \{Alisha M.\} and Santavicca, \{Daniel F.\} and Mullen, \{Thomas J.\}",

note = "Publisher Copyright: Copyright {\textcopyright} 2019 American Chemical Society.",

year = "2020",

month = jan,

day = "9",

doi = "10.1021/acs.jpcc.9b10364",

language = "English",

volume = "124",

pages = "1214--1219",

number = "1",

}

TY - JOUR

T1 - Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

AU - Patron, Alexandra M.

AU - Bramer, Alisha M.

AU - Santavicca, Daniel F.

AU - Mullen, Thomas J.

PY - 2020/1/9

Y1 - 2020/1/9

UR - https://www.scopus.com/pages/publications/85077015126

UR - https://www.scopus.com/pages/publications/85077015126#tab=citedBy

U2 - 10.1021/acs.jpcc.9b10364

DO - 10.1021/acs.jpcc.9b10364

M3 - Article

AN - SCOPUS:85077015126

SN - 1932-7447

VL - 124

SP - 1214

EP - 1219

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 1

ER -